DUV
The Development
of 157nm Small Field and Mid-Field MicroSteppers
Ron E. Miller, Paul Bischoff, Roger Sumner, Steve Bowler, Warren
W. Flack, Galen Fong
Mix-and-Match
Efficient Overlay Optimization
of Stepper Correctables
Warren W. Flack, Susan Avlakeotes, David Chen, and Gary E. Flores,
Ultratech, Inc. (SPIE, 1996)
Application of Pattern Recognition
in Mix-and-Match Lithography
Warren W. Flack, Gary E. Flores and Thinh Tran, Ultratech, Inc.
(SPIE, 1995)
An Optimized Registration Model
for 2:1 Stepper Field Matching
Warren W. Flack and Gary E. Flores, Ultratech, Inc.
Joseph C. Pellegrini, New Visions Systems, Mark Merrill, KLA
Instruments Corporation (SPIE, 1994)
The Implementation and Characterization
of Advanced Mix-and-Match Lithography
Gary Flores, Warren Flack & John Cossins, Ultratech, Inc.
(SEMICON/Europa, 1994)
Registration Modeling and Simulation
in Advanced Mix-and-Match Lithography
Warren W. Flack and Gary E. Flores, Ultratech, Inc.
Joseph C. Pellegrini, New Vision Systems, Mark Merrill, KLA Instruments
Corporation (3-Beam, 1994)
Registration Simulations and Sampling
Strategies for Large Field Lithography
Gary E. Flores and Warren W. Flack, Ultratech, Inc.
Joseph C. Pellegrini, New Visions Systems, Mark Merrill, KLA
Instruments Corporation (OCG Interface, 1994)
A Reticle Correction Technique
to Minimize Lens Distortion Effects
Warren W. Flack, Gary E. Flores, Alan Walther and Manny Ferreira,
Ultratech, Inc. (BACUS Symposium, 1994)
Lithographic Performance of a New
Generation i-line Optical System: A Comparative Analysis
Gary Flores, Warren Flack, Lynn Dwyer, Ultratech, Inc. (SPIE,
1993)
Optical Networking
Lithographic Chip Identification:
Meeting the Failure Analysis Challenge
Lynn Dwyer, Kevin Riddell, Ultratech, Inc., Warren Flack, TRW
Inc.
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